Focused ion beam milling of photonic crystals in silicon on insulator

Share/Save/Bookmark

Hu, Wenbin and Hopman, Wico and Ridder de, René (2009) Focused ion beam milling of photonic crystals in silicon on insulator. Journal of Wuhan University of Technology (Wuhan Ligong Daxue Xuebao), 31 (2). pp. 73-76. ISSN 1671-4431

[img]PDF
Restricted to UT campus only
: Request a copy
1736Kb
Abstract:A photonic crystal slab, consisting of an array of circular sub-micron diameter holes in Silicon on Insulator (SOI), has been fabricated using focused ion beam (FIB) milling. This application requires the sidewalls of the holes to be very smooth and as nearly perpendicular to the slab as possible. The shape of holes is adversely affected by redeposition of milled material. The effects on the sidewall shape due to different FIB parameters, such as beam current, dwell time, and scanning pattern have been researched. It is shown that a spiral-shaped scanning pattern performs much better than the conventional rater scan. A combination of dwell time, beam current and number of scanning loops, optimising the geometry of holes, has been determined.
Item Type:Article
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/67837
Official URL:http://dx.doi.org/10.3963/j.issn.1671-4431.2009.02.0019
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 264414