Focused ion beam milling of photonic crystals in bulk silicon

Hu, Wenbin and Ridder de, René M. and Tong, Xing-Lin (2009) Focused ion beam milling of photonic crystals in bulk silicon. Journal of Wuhan University of Technology (Wuhan Ligong Daxue Xuebao), 31 (1). pp. 124-127. ISSN 1671-4431

Preview

PDF
1814Kb

Abstract:	Focused ion beam (FIB) direct milling was used to fabricate photonic crystals in bulk silicon. The milling requires the sidewalls as nearly perpendicular to the slab as possible and the top profile of the holes to be smooth. The re-deposition of milled material exaggerates the hole profiles. The effects on the sidewall profile and the top periphery due to the beam current, dwell time, and the extra boundary milling have been researched. It turns out that a combination of beam current, dwell time, and milling depth has optimized the sidewalls and top periphery of the holes.
Item Type:	Article
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/67798
Official URL:	http://dx.doi.org/10.3963/j.issn.1671-4431.2009.01.032
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Show download statistics for this publication

Repository Staff Only: item control page

Metis ID: 264408