Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

Kim, G.M. and Kovalgin, A.Y. and Holleman, J. and Brugger, J. (2002) Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching. Journal of Nanoscience and Nanotechnology, 2 (1). pp. 55-59. ISSN 1533-4880

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Abstract:	A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation tempera- ture and time and con
Item Type:	Article
Copyright:	© 2002 American Scientific Publishers
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/67752
Official URL:	http://dx.doi.org/10.1166/jnn.2002.073
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