The RF-CV method for characterization of leaky gate dielectrics


Schmitz, J. and Cubaynes, F.N. and Kort, R. de and Havens, R.J. and Scholten, A.J. and Tiemeijer, L.F. (2004) The RF-CV method for characterization of leaky gate dielectrics. In: 13th Biannual Conference on Insulating Films on Semiconductors, 18 June 2003, Barcelona, Spain.

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Abstract:This paper presents a new method, developed for the capacitance-voltage (C-V ) characterization of leaky dielectrics. The method comprises measurements in the gigahertz range on specially designed RF test structures. The method is veri?ed against high-frequency C-V measurements on NMOS and PMOS structures. It yields reliable results even when the gate leakage is in excess of 100 A/cm2.
Item Type:Conference or Workshop Item
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Metis ID: 213397