Wafer level reliability monitoring strategy of an advanced multi-process CMOS foundry

Scarpa, Andrea and Tao, Guoqiao and Kuper, Fred G. (2000) Wafer level reliability monitoring strategy of an advanced multi-process CMOS foundry. In: 41st Annual IEEE International International Reliability Physics Symposium, IRPS 2003, 30 March - 4 April 2003, Dallas, TX, USA.

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Abstract:	In an advanced multi-process CMOS foundry it is strategically important to make use of an optimum reliability monitoring strategy, in order to be able to run well controlled processes. Philips Semiconductors Business Unit Foundries wafer fab MOS4YOU has developed an end-of-line ultra-fast reliability monitoring strategy, which provides a very fast and continuous feedback to the production line. In this work the advantages of such strategy are discussed by means of example cases, including hot-carrier reliability and a new end-of-line monitoring tool for non-volatile memory reliability.
Item Type:	Conference or Workshop Item
Copyright:	© 2000 IEEE
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/67500
Official URL:	http://dx.doi.org/10.1109/RELPHY.2003.1197826
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