Far-field scattering microscopy applied to analysis of slow light, power enhancement, and delay times in uniform Bragg waveguide gratings

Hopman, W.C.L. and Hoekstra, H.J.W.M. and Dekker, R. and Zhuang, L. and Ridder de, R.M. (2007) Far-field scattering microscopy applied to analysis of slow light, power enhancement, and delay times in uniform Bragg waveguide gratings. Optics Express, 15 (4). pp. 1851-1870. ISSN 1094-4087

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Abstract:	A novel method is presented for determining the group index, intensity enhancement and delay times for waveguide gratings, based on (Rayleigh) scattering observations. This far-field scattering microscopy (FScM) method is compared with the phase shift method and a method that uses the transmission spectrum to quantify the slow wave properties. We find a minimum group velocity of 0.04c and a maximum intensity enhancement of ~14.5 for a 1000-period grating and a maximum group delay of ~80 ps for a 2000-period grating. Furthermore, we show that the FScM method can be used for both displaying the intensity distribution of the Bloch resonances and for investigating out of plane losses. Finally, an application is discussed for the slow-wave grating as index sensor able to detect a minimum cladding index change of $10^{-8}$ , assuming a transmission detection limit of $10^{-4}$ .
Item Type:	Article
Copyright:	© 2007 Optical Society of America
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS) Telecommunication Engineering (TE)
Link to this item:	http://purl.utwente.nl/publications/67030
Official URL:	http://www.opticsinfobase.org/abstract.cfm?URI=oe-15-4-1851
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