Nano-flow thermal sensor applying dymamic w-2w sensing method


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Dijkstra, M. and Lammerink, T.S.J. and Wiegerink, R.J. and Elwenspoek, M. (2006) Nano-flow thermal sensor applying dymamic w-2w sensing method. In: 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006, 3-5 September 2006, Southampton, England.

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Abstract:This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/66904
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