Optimization of Low-Loss $AL_{2}O_{3}$ Waveguide Fabrication for Application in Active Integrated Optical Devices


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Wörhoff, K. and Ay, F. and Pollnau, M. (2006) Optimization of Low-Loss $AL_{2}O_{3}$ Waveguide Fabrication for Application in Active Integrated Optical Devices. In: Science and Technology of Dielectrics for Active and Passive Photonic Devices, 29 Oct - 3 Nov 2006, Cancun, Mexico (pp. pp. 17-26).

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Abstract:In this paper we will present the fabrication and properties of reactively co-sputtered $AL_{2}O_{3}$ layers, being a very promising host material for active integrated optics applications such as rare-earth ion doped laser devices. The process optimization towards a reactive co-sputtering process, which resulted in stable, target condition-independent deposition of $AL_{2}O_{3}$ with high optical quality will be discussed in detail. The loss value of as-deposited optical waveguides sputtered by the optimized process has been measured. The loss in the near infrared wavelength range was 0.3 dB/cm. Furthermore $AL_{2}O_{3}$ material hosts fabricated by sputtering techniques are compatible with Si-based integrated optical technology and allow for uniform deposition over a large substrate area.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/66565
Official URL:http://dx.doi.org/10.1149/1.2392916
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