Magnetic properties of electrodeposited Co-W thin films

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Admon, U. and Dariel, M.P. and Grunbaum, E. and Lodder, J.C. (1987) Magnetic properties of electrodeposited Co-W thin films. Journal of Applied Physics, 62 (5). pp. 1943-1947. ISSN 0021-8979

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Abstract:Thin films of Co-W, 300-500 Å thick, were electrodeposited at various compositions under a wide range of plating conditions. The saturation magnetization, coercivity, and squareness ratio of the films were derived from the parallel (in-plane) and perpendicular hysteresis loops, measured by using a vibrating sample magnetometer. The magnetic properties of the films are strongly related to their microstructure. The nonmagnetic alloying elements (W) affects the saturation magnetization via the dilution mechanism. The in-plane coercivity, which increases with increasing content of the hexagonal phase and with decreasing degree of [0001]h texture, is in range of 100-600 Oe for the crystalline deposits and decreases to a few oersteds for amorphous deposits. The in-plane squareness ratio increases with the fcc or amorphous phase content and with decreasing degree of [0001]h texture. The magnetic measurements suggest that films that appeared amorphous according to their electron diffraction patterns are actually microcrystalline or at least partially crystallized.
Item Type:Article
Copyright:© 1987 American Institute of Physics
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/66080
Official URL:http://link.aip.org/link/doi/10.1063/1.339531
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