Laser interference lithography with highly accurate interferometric alignment

Soest van, Frank J. and Wolferen van, Henk A.G.M. and Hoekstra, Hugo J.W.M. and Ridder de, René M. and Wörhoff, Kerstin and Lambeck, Paul V. (2005) Laser interference lithography with highly accurate interferometric alignment. Japanese Journal of Applied Physics, Part 1: Regular papers and short notes, 44 (9A). pp. 6568-6570. ISSN 0021-4922

Preview

PDF
257Kb

Abstract:	It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.
Item Type:	Article
Copyright:	© 2005 The Japan Society of Applied Physics
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/65579
Official URL:	http://dx.doi.org/10.1143/JJAP.44.6568
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Repository Staff Only: item control page

Metis ID: 227926