Laser interference lithography with highly accurate interferometric alignment

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Soest, Frank J. van and Wolferen, Henk A.G.M. van and Hoekstra, Hugo J.W.M. and Ridder, René M. de and Wörhoff, Kerstin and Lambeck, Paul V. (2005) Laser interference lithography with highly accurate interferometric alignment. In: Twelfth European Conference on Integrated Optics, ECIO'05, 6-8 Apr 2005, Grenoble, France (pp. pp. 570-573).

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Abstract:It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/65578
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