Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

Bostan, Cazimir G. and Ridder de, René M. and Gadgil, Vishwas J. and Kelderman, Henry and Driessen, Alfred and Kuipers, Laurens (2005) Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching. In: Twelfth European Conference on Integrated Optics, ECIO'05, 6-8 Apr 2005, Grenoble, France.

Preview

PDF
598Kb

Abstract:	A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/65577
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Repository Staff Only: item control page

Metis ID: 228193