Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

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Bostan, Cazimir G. and Ridder de, René M. and Gadgil, Vishwas J. and Kelderman, Henry and Driessen, Alfred and Kuipers, Laurens (2005) Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching. In: Twelfth European Conference on Integrated Optics, ECIO'05, 6-8 Apr 2005, Grenoble, France.

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Abstract:A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/65577
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Metis ID: 228193