Four point probe structures with buried electrodes for the electrical characterization of ultrathin conducting films
Groenland, A.W. and Wolters, R.A.M. and Kovalgin, A.Y. and Schmitz, J. (2009) Four point probe structures with buried electrodes for the electrical characterization of ultrathin conducting films. In: IEEE International Conference on Microelectronic Test Structures, ICMTS 2009, 30 March - 2 April 2009, Oxnard, CA, USA (pp. pp. 191-195).
|Abstract:||Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on buried electrodes on which the ultrathin film is deposited.
This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm. It is shown that these structures can be used successfully to characterize sub 10 nm films.
|Item Type:||Conference or Workshop Item|
|Additional information:||Best paper award ICMTS 2009|
|Copyright:||© 2009 IEEE|
Electrical Engineering, Mathematics and Computer Science (EEMCS)
|Link to this item:||http://purl.utwente.nl/publications/65460|
|Export this item as:||BibTeX|
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