Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures


Brunets, I. and Loon, R.V.A. van and Walters, R.J. and Polman, A. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2008) Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures. In: 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008, 27-28 November 2008, Veldhoven, The Netherlands (pp. pp. 399-402).

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Abstract:In this work, we realize light emitting functional multilayer (Al2O3 / Si-nanocrystals (Si-NC)) stacks at low temperatures (300-325 °C) by a combination of ALD and CVD techniques. The multilayer structure was obtained by a sequential deposition of a 20 nm-thick ALD Al2O3 film, followed by LPCVD of a Si-NC layer, without vacuum break. A high nanocrystal density was achieved through an enhanced nucleation rate by using trisilane (Si3H8, known as Silcore®) as precursors for LPCVD of Si-NC layers. The photoluminescence and electroluminescence of the functional multilayer stacks were measured. A decrease of the Si-NC deposition time (i.e. smaller size of Si-NC’s) provided a gradual shift of the photoluminescence peak to higher photon energies, indicating exciton confinement in the nanocrystals.
Item Type:Conference or Workshop Item
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Metis ID: 254994