3D-Nanomachining using corner lithography


Berenschot, J.W. and Tas, N.R. and Jansen, H.V. and Elwenspoek, M.C. (2008) 3D-Nanomachining using corner lithography. In: 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, 6-9 Jan 2008, Sanya, China (pp. pp. 729-732).

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Abstract:We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.
Item Type:Conference or Workshop Item
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/65148
Official URL:https://doi.org/10.1109/NEMS.2008.4484432
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