A study of cross-bridge kelvin resistor structures for reliable measurement of low contact resistances

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Kovalgin, A.Y. and Wolters, R.A.M. (2008) A study of cross-bridge kelvin resistor structures for reliable measurement of low contact resistances. In: Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures, 24-28 Mar 2008, Edinburgh, Schotland.

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Abstract:	The parasitic factors that strongly influence the measurement accuracy of Cross-Bridge Kelvin Resistor (CBKR) structures for low specific contact resistances (ρc) have been extensively discussed during last few decades and the minimum of the ρc value, which could be accurately extracted, was estimated. We fabricated a set of various metal-to-metal CBKR structures with different geometries, i.e., shapes and dimensions, to confirm this limit experimentally. As a result, a model was developed to account for the actual current flow and a method for reliable ρc extraction was created. It was found that in our case of metal-to-metal contacts, the measured CBKR contact resistance was determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/64875
Official URL:	http://dx.doi.org/10.1109/ICMTS.2008.4509338
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