Statistical relation between particle contaminations in ultra pure water and defects generated by process tools

Wali, Faisal and Knotter, D. Martin and Wortelboer, Ronald and Mud, Auke (2007) Statistical relation between particle contaminations in ultra pure water and defects generated by process tools. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands.

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Abstract:	Ultra pure water supplied inside the Fab is used in different tools at different stages of processing. Data of the particles measured in ultra pure water was compared with the defect density on wafers processed on these tools and a statistical relation is found.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/64584
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