Focused ion beam nano-structuring of $Al_2O_3$ dielectric layers for photonic applications

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Ay, Feridun and Bradley, Jonathan D.B. and Hopman, Wico C.L. and Gadgil, Vishwas J. and Ridder, René M. de and Wörhoff, Kerstin and Pollnau, Markus (2007) Focused ion beam nano-structuring of $Al_2O_3$ dielectric layers for photonic applications. In: 33rd International Conference on Micro- and Nano-Engineering 2007, 23-26 September 2007, Copenhagen, Denmark (pp. pp. 627-628).

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Abstract:In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/64432
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