Focused ion beam nano-structuring of $Al_2O_3$ dielectric layers for photonic applications


Ay, Feridun and Bradley, Jonathan D.B. and Hopman, Wico C.L. and Gadgil, Vishwas J. and Ridder, René M. de and Wörhoff, Kerstin and Pollnau, Markus (2007) Focused ion beam nano-structuring of $Al_2O_3$ dielectric layers for photonic applications. In: 33rd International Conference on Micro- and Nano-Engineering 2007, 23-26 September 2007, Copenhagen, Denmark (pp. pp. 627-628).

open access
Abstract:In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.
Item Type:Conference or Workshop Item
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:
Export this item as:BibTeX
HTML Citation
Reference Manager


Repository Staff Only: item control page

Metis ID: 248718