Moisture resistance of SU-8 and KMPR as structural material

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Blanco Carballo, V.M. and Melai, J. and Salm, C. and Schmitz, J. (2009) Moisture resistance of SU-8 and KMPR as structural material. Microelectronic Engineering, 86 (4-6). pp. 765-768. ISSN 0167-9317

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Abstract:This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.
Item Type:Article
Copyright:© 2009 Elsevier Science
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62786
Official URL:http://dx.doi.org/10.1016/j.mee.2008.12.076
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