Electrical characterization of advanced gate dielectrics


Degraeve, R. and Schmitz, J. and Pantisano, L. and Simoen, E. and Houssa, M. and Kaczer, B. and Groeseneken, G. (2007) Electrical characterization of advanced gate dielectrics. In: M. Baklanov & M. Green & K. Maex (Eds.), Dielectric Films for Advanced Microelectronics. Wiley series in materials for electronic & optoelectronic applications . John Wiley & Sons Ltd., England, pp. 371-435. ISBN 9780470013601

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Abstract:The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials.
This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62754
Official URL:http://eu.wiley.com/WileyCDA/WileyTitle/productCd-0470013605,descCd-description.html
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