Bragg gratings in $Al_2O_3$ Channel waveguides by focused ion beam milling


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Ay, F. and Bradley, J.D.B. and Ridder, R.M. de and Wörhoff, K. and Pollnau, M. (2008) Bragg gratings in $Al_2O_3$ Channel waveguides by focused ion beam milling. In: 13th Annual Symposium of the IEEE LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands (pp. pp. 215-217).

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Abstract:We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62685
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