Influence of interfacial layer on contact resistance


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Roy, D. and In 't Zand, M.A.A. and Delhounge, R. and Klootwijk, J.H. and Wolters, R.A.M. (2008) Influence of interfacial layer on contact resistance. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands.

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Abstract:The contact resistance between two materials is dependent on the intrinsic properties of the materials in contact and the presence and properties of an interfacial layer at the contact. This article presents the difference in contact resistance measurements with and without the presence of a process limiting interfacial layer. These measurements are performed using Cross Bridge Kelvin Resistor (CBKR) test structures on TiW- Phase Change Material (PCM) contacts.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62612
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