Capillary filling of sub- 10 nm nanochannels

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Haneveld, J. and Tas, N.R. and Brunets, N. and Jansen, H.V. and Elwenspoek, M.C. (2008) Capillary filling of sub- 10 nm nanochannels. Journal of applied physics, 104 (1). p. 14309. ISSN 0021-8979

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Abstract:We have developed a procedure for accurate fabrication of silicon-based nanochannels down to a few nanometer channel height, based on the use of a thin thermal silicon oxide spacer layer. Nanochannels with a predictable and carefully measured height between 5 and 50 nm were successfully fabricated and filled with de-ionized water. For all channel heights the filling kinetics behaves according to the classical Washburn law for capillary filling, with a small correction for a loss of liquid at the moving front at a constant rate and a smaller than expected Washburn coefficient (up to a factor of 1.6 smaller for water in 5 nm channels)
Item Type:Article
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62564
Official URL:http://dx.doi.org/10.1063/1.2952053
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