Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

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Sparreboom, Wouter and Eijkel, Jan C.T. and Bomer, Johan and Berg, Albert van den (2008) Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes. Lab on a Chip, 8 (3). pp. 402-407. ISSN 1473-0197

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Abstract:We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.
Item Type:Article
Copyright:© 2008 RSC Publishing
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62375
Official URL:http://dx.doi.org/10.1039/b716382g
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Metis ID: 251054