Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

Sparreboom, Wouter and Eijkel, Jan C.T. and Bomer, Johan and Berg van den, Albert (2008) Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes. Lab on a Chip, 8 (3). pp. 402-407. ISSN 1473-0197

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Abstract:	We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.
Item Type:	Article
Copyright:	© 2008 RSC Publishing
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Biomedical and Environmental Sensor systems (BIOS)
Link to this item:	http://purl.utwente.nl/publications/62375
Official URL:	http://dx.doi.org/10.1039/b716382g
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