Simple technique for direct patterning of nanowires using a nanoslit shadow-mask


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Tong, H.D. and Jansen, H.V. and Tas, N.R. and Gadgil, V.J. and Carlen, E.T. and Berg, A. van den (2007) Simple technique for direct patterning of nanowires using a nanoslit shadow-mask. In: International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007, 10-14 June 2007, Paris, France (pp. pp. 191-194).

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Abstract:Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm
Item Type:Conference or Workshop Item
Copyright:© 2007 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/62152
Official URL:http://dx.doi.org/10.1109/SENSOR.2007.4300103
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