Band Offset Measurements on Ultra-Thin (100) SOI MOSFETs

Steen van der, J.-L.P.J. and Hueting, R.J.E. and Smit, G.D.J. and Hoang, T. and Holleman, J. and Schmitz, J. (2007) Band Offset Measurements on Ultra-Thin (100) SOI MOSFETs. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands.

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Abstract:	This work shows experimental evidence of structural quantum confinement showing up in the electrical device characteristics through a widening of the band gap. In this work, subthreshold currents in long channel ultra-thin SOI MOSFETs with (100) crystal orientation have been analyzed for various temperatures and different silicon body thicknesses in order to extract shifts in the band edges. Although the offsets in both the valence band and conduction band contribute to the total band gap, this work concentrates on the valence band offset, as the investigated devices are p-MOSFETs. Likewise, changes in the conduction band can be measured on n-type devices. The valence band edge was found to move downward for decreasing silicon body thickness, corresponding to a widening of the band gap. This implies that devices with an extremely thin semiconductor body exhibit a stronger temperature dependence. Good agreement with theory was observed.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/62112
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