Fast etching of sacrificial galvanic coupled metals for nanochannel fabrication: experiments and theory


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Sparreboom, W. and Eijkel, J.C.T. and Berg, A. van den (2007) Fast etching of sacrificial galvanic coupled metals for nanochannel fabrication: experiments and theory. In: Eleventh International Conference on Miniaturized Systems for Chemistry and Life Sciences - The proceedings of microTAS 2007 Conference, 7-11 october 2007, Paris (pp. pp. 515-517).

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Abstract:We demonstrate a 10-fold enhancement of the etch rate of sacrificial metals for
nanochannel fabrication by galvanic coupling. This results in an etch time for the here
examined nanochannels of 10 hours instead of 9 days without galvanic coupling. An
additional feature of our device is that we integrated bare electrodes inside the channel.
Furthermore, we offer a theoretical explanation of the observed etch rate based on mass
transport.
Item Type:Conference or Workshop Item
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/62038
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Metis ID: 245818