Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

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Boogaard, Arjen and Kovalgin, Alexey and Aarnink, Tom and Wolters, Rob and Holleman, Jisk and Brunets, Ihor and Schmitz, Jurriaan (2006) Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

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Abstract:We measured electron density and electron energy distribution function (EEDF) vertically through our reactor for a range of process conditions and for various gases. The EEDF of Ar plasma could largely be described by the Maxwell-Boltzmann distribution function, but it also contained a fraction (~ 1E-03) of electrons which were faster (20-40 eV). At low pressures (6.8-11 µbar), the fast-electron tail shifted to higher energies (Emax ~ 50 eV) as we measured more towards the chuck. The fast-electron tail shifted to lower energies (Emax ~ 30 eV) when we increased pressure to 120 µbar or applied an axial magnetic field of 9.5 µT. Addition of small amounts of N2 (1-10%) or N2O (5%) to Ar plasma lowered the total density of slow electrons (approx. by a factor of two) but did not change the shape of the fast-electron tail of the EEDF. The ionization degree of Ar-plasma increased from 2.5E-04 to 5E-04 when a magnetic field of 9.5 µT was applied.
Item Type:Article
Additional information:209th ECS Meeting, May 7-May 12, 2006 , Denver, Colorado Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Processing 3 Editor(s): M. Swihart, D. Goodwin, R. Schmid, M. Sugiyama, C. Wolden
Copyright:© 2006 The Electrochemical Society
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/61707
Official URL:http://dx.doi.org/10.1149/1.2408913
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Metis ID: 238642