Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

Boogaard, Arjen and Kovalgin, Alexey and Aarnink, Tom and Wolters, Rob and Holleman, Jisk and Brunets, Ihor and Schmitz, Jurriaan (2006) Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

PDF
Restricted to UT campus only: Request a copy
316Kb

Abstract:	We measured electron density and electron energy distribution function (EEDF) vertically through our reactor for a range of process conditions and for various gases. The EEDF of Ar plasma could largely be described by the Maxwell-Boltzmann distribution function, but it also contained a fraction (~ 1E-03) of electrons which were faster (20-40 eV). At low pressures (6.8-11 µbar), the fast-electron tail shifted to higher energies (Emax ~ 50 eV) as we measured more towards the chuck. The fast-electron tail shifted to lower energies (Emax ~ 30 eV) when we increased pressure to 120 µbar or applied an axial magnetic field of 9.5 µT. Addition of small amounts of N2 (1-10%) or N2O (5%) to Ar plasma lowered the total density of slow electrons (approx. by a factor of two) but did not change the shape of the fast-electron tail of the EEDF. The ionization degree of Ar-plasma increased from 2.5E-04 to 5E-04 when a magnetic field of 9.5 µT was applied.
Item Type:	Article
Copyright:	© 2006 The Electrochemical Society
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/61707
Official URL:	http://dx.doi.org/10.1149/1.2408913
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Repository Staff Only: item control page

Metis ID: 238642