Rate control in dual source evaporation


Wielinga, T. and Gruisinga, W. and Leeuwis, H. and Lodder, J.C. and Weers, J.F. van and Wilmans, J.C. (1980) Rate control in dual source evaporation. Journal of Physics E: Scientific Instruments, 13 (2). p. 170. ISSN 0022-3735

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Abstract:Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured separately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in the case Gd-Fe and Gd-Co films.
Item Type:Article
Copyright:© 1980 Institute of Physics
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Link to this item:http://purl.utwente.nl/publications/60489
Official URL:https://doi.org/10.1088/0022-3735/13/2/014
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