Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures

Share/Save/Bookmark

Azarov, A.V. and Peters, P.J.M. and Boller, K.-J. (2008) Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures. Applied physics B: Lasers and optics, 90 (3-4). pp. 455-460. ISSN 0946-2171

[img]
Preview
PDF
468Kb
Abstract:Spatial and temporal gain profiles as well as the peak net gain at 193 nm have been measured in X-ray preionized discharges excited by a single pulse electrical system working in the charge transfer mode. Ar- and F2-containing laser gas mixtures with He or Ne as a buffer gas have been used. With a pumping pulse duration of ~ 100 ns (FWHM) and a specific peak power deposition of ~ 1 MW cm-3 bar-1 in a gas mixture containing F2 : Ar : He (0.1%:5%:94.9%), at 2 bar total pressure, a very high peak net gain coefficient of ~30% cm-1 was measured in the gas discharge. The FWHM of the gain waveform was ~ 60 ns
Item Type:Article
Copyright:© 2008 Springer
Faculty:
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/59961
Official URL:http://dx.doi.org/10.1007/s00340-007-2854-9
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 244488