Focused ion beam milling of three dimensional nanostructures with high precision

Tjerkstra, R.W. and Segerink, F.B. and Kelly, J.J. and Vos, W.L. (2008) Focused ion beam milling of three dimensional nanostructures with high precision. In: Proceedings of the First International Workshop on FIB for Photonics : Eindhoven, the Netherlands, 13-14 June 2008. University of Twente, Enschede, The Netherlands, pp. 42-45. ISBN 9789036526784

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Abstract:	The fabrication of an extended three-dimensional nanostructure with dimensions much larger than the feature size using a focused ion beam is described. By milling two identical patterns of pores with a designed diameter of 460 nm in orthogonal directions, a photonic crystal with an inverse woodpile structure was made in a gallium phosphide single crystal. The patterns are aligned with an unprecedented accuracy of 30 nm with respect to each other. The influence of GaP redeposition on the depth, shape, and size of the pores is described. The work is published in J. Vac. Sci. Technol. B [1].
Item Type:	Book Section
Faculty:	Science and Technology (TNW)
Research Group:	Complex Photonic Systems (CoPS)
Link to this item:	http://purl.utwente.nl/publications/59831
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