Edge Transfer Lithography Using Alkanethiol Inks


Sharpe, Ruben B.A. and Titulaer, Bram J.F. and Peeters, Emiel and Burdinski, Dirk and Huskens, Jurriaan and Zandvliet, Harold J.W. and Reinhoudt, David N. and Poelsema, Bene (2006) Edge Transfer Lithography Using Alkanethiol Inks. Nano Letters, 6 (6). pp. 1235-1239. ISSN 1530-6984

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Abstract:Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.
Item Type:Article
Copyright:© 2006 American Chemical Society
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/59488
Official URL:https://doi.org/10.1021/nl0607885
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