Nanoimprint Lithography for Nanophotonics in Silicon

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Bruinink, Christiaan M. and Burresi, Matteo and Boer de, Meint J. and Segerink, Frans B. and Jansen, Henri V. and Berenschot, E. and Reinhoudt, David N. and Huskens, Jurriaan and Kuipers, L. (2008) Nanoimprint Lithography for Nanophotonics in Silicon. Nano Letters, 8 (9). pp. 2872-2877. ISSN 1530-6984

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Abstract:A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
Item Type:Article
Copyright:© 2008 American Chemical Society
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/59457
Official URL:http://dx.doi.org/10.1021/nl801615c
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