High temperature surface imaging using atomic force microscopy


Broekmaat, Joska and Brinkman, Alexander and Blank, Dave H.A. and Rijnders, Guus (2008) High temperature surface imaging using atomic force microscopy. Applied Physics Letters, 92 (4). 043102 . ISSN 0003-6951

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Abstract:Atomic force microscopy (AFM) is one of the most important tools in nanotechnology and surface science. Because of recent developments, nowadays, it is also used to study dynamic processes, such as thin film growth and surface reaction mechanisms. These processes often take place at high temperature and there is a clear need to extend the current operating temperature range of AFM. This letter describes a heating stage and a modified AFM that extends the maximum operating temperature to 750°C. Atomic step resolution is obtained up to 500°C in ambient and even up to 750°C in vacuum.
Item Type:Article
Copyright:© 2008 American Institute of Physics
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/59168
Official URL:https://doi.org/10.1063/1.2836943
Publisher URL:http://link.aip.org/link/?APPLAB/92/043102/1
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