Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

Prodan, L. and Euser, T.G. and Wolferen van, H.A.G.M. and Bostan, C. and Ridder de, R.M. and Beigang, R. and Boller, K.-J. and Kuipers, L. (2004) Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography. Nanotechnology, 15 (5). pp. 639-642. ISSN 0957-4484

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Abstract:	We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2.
Item Type:	Article
Copyright:	© 2004 Institute of Physics
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS) Science and Technology (TNW)
Research Group:	Integrated Optical MicroSystems (IOMS) Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/58857
Official URL:	http://dx.doi.org/10.1088/0957-4484/15/5/040
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