Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

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Prodan, L. and Euser, T.G. and Wolferen, H.A.G.M. van and Bostan, C. and Ridder, R.M. de and Beigang, R. and Boller, K.-J. and Kuipers, L. (2004) Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography. Nanotechnology, 15 (5). pp. 639-642. ISSN 0957-4484

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Abstract:We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2.
Item Type:Article
Copyright:© 2004 Institute of Physics
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/58857
Official URL:http://dx.doi.org/10.1088/0957-4484/15/5/040
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