Characterization of Slow-Light in a LIL-Fabricated Si3N4 Waveguide Grating


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Hopman, W.C.L. and Yudistira, D. and Dekker, R. and Engbers, W.F.A. and Hoekstra, H.J.W.M. and Ridder, R.M. de (2005) Characterization of Slow-Light in a LIL-Fabricated Si3N4 Waveguide Grating. In: IEEE/LEOS Benelux Chapter 2005 Annual Symposium, December 1-2, 2005, Mons, Belgium (pp. pp. 109-112).

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Abstract:The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Metis ID: 228221