Low loss, high contrast optical waveguides based on CMOS compatible LPCVD processing: technology and experimental results


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Heideman, R.G. and Melloni, A. and Hoekman, M. and Borreman, A. and Leinse, A. and Morichetti, F. (2005) Low loss, high contrast optical waveguides based on CMOS compatible LPCVD processing: technology and experimental results. In: IEEE/LEOS Benelux Chapter 2005 Annual Symposium, December 1-2, 2005, Mons, Belgium.

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Abstract:A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatible LPCVD processing. This technology allows for medium and high index contrast waveguides with very low channel attenuation. The geometry is basically formed by a rectangular cross-section silicon nitride (Si3N4) filled with and encapsulated by silicon dioxide (SiO2). The birefringence and minimal bend radius of the waveguide is completely controlled by the geometry of the waveguide layer structures. Experiments on typical geometries will be presented, showing excellent characteristics (channel attenuation ≤ 0.1 dB/cm, IL ≤ 1.5 dB, PDL ≤ 0.2 dB, Bg ≤ 1×10-4, bend radius « 1 mm).
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/58218
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