Direct measurement of the on-chip insertion loss of high finesse microring resonators in Si3N4-SiO2 technology.
Tan, F.S. and Klunder, D.J.W. and Bulthuis, H.F. and Sengo, G. and Hoekstra, H.J.W.M. and Driessen, A. (2001) Direct measurement of the on-chip insertion loss of high finesse microring resonators in Si3N4-SiO2 technology. In: IEEE/LEOS Benelux Chapter 2001 Annual Symposium, December 3, 2001, Brussels, Belgium.
|Abstract:||Microring resonators show the possibility for designing Very Large Scale Integrated (VLSI) photonic circuits by cascading them. In order to realize the devices, the on-chip insertion loss becomes an important parameter. The direct measurement of the on-chip insertion loss of a high finesse microring resonator will be presented. Its value (0.1 ± 0.1) dB is low, in agreement with calculations.|
|Item Type:||Conference or Workshop Item|
Electrical Engineering, Mathematics and Computer Science (EEMCS)
|Link to this item:||http://purl.utwente.nl/publications/58185|
|Export this item as:||BibTeX|
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