CeO2 and HfO2 high-k gate dielectrics by pulsed laser deposition : from binary oxides to nanolaminates


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Karakaya, Koray (2006) CeO2 and HfO2 high-k gate dielectrics by pulsed laser deposition : from binary oxides to nanolaminates. thesis.

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Abstract:the selection criteria for high-k materials, the role of pulsed laser deposition in materials research activities and other major points in this thesis are presented.
Item Type:Thesis
Link to this item:http://purl.utwente.nl/publications/55928
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