High resolution magnetic force microscopy using focussed ion beam modified tips


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Phillips, G.N. and Siekman, M.H. and Abelmann, L. and Lodder, J.C. (2002) High resolution magnetic force microscopy using focussed ion beam modified tips. In: IEEE International Magnetics Conference, INTERMAG Europe 2002, April 28 - May 2, 2002, Amsterdam, The Netherlands.

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Magnetic force microscopy (MFM) is well established for imaging surface magnetic stray fields. With commercial microscopes and magnetic tips, images with 50 nm resolution are quite routine; however, obtaining higher resolutions is experimentally more demanding. Higher resolution is required for imaging patterned magnetic elements and the latest magnetic media where bit lengths are less than 40 nm. Sub-30 nm resolution images of a 20 bilayer Co/sub 50/Ni/sub 50//Pt thin film have been obtained using Si tips coated with Co and modified by focused ion beam (FIB) milling. Imaging was performed at room temperature, in air, with a Digital Instruments D13100 MFM in tapping/lift mode.
Item Type:Conference or Workshop Item
Copyright:©2002 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/55897
Official URL:http://dx.doi.org/10.1109/INTMAG.2002.1000808
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