Modeling of chemical vapor deposition in a fluidized bed reactor based on discrete particle simulation

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Czok, Ggregor and Ye, Mao and Kuipers, J.A.M. and Werther, Joachim (2005) Modeling of chemical vapor deposition in a fluidized bed reactor based on discrete particle simulation. International Journal of Chemical Reactor Engineering, 3 (A57). ISSN 1542-6580

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Abstract:For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.
Item Type:Article
Copyright:© 2005 The Author(s)
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Link to this item:http://purl.utwente.nl/publications/54603
Official URL:http://www.bepress.com/ijcre/vol3/A57
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