Analysis Of Micromachined Capacitive Incremental Position Sensor


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Kuijpers, A.A. and Krijnen, G.J.M. and Wiegerink, R.J. and Lammerink, T.S.J. and Elwenspoek, M.C. (2005) Analysis Of Micromachined Capacitive Incremental Position Sensor. In: 16th MicroMechanics Europe Workshop, MME 2005, 4-6 September 2005, Göteborg, Sweden.

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Abstract:This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/54429
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