Analysis Of Micromachined Capacitive Incremental Position Sensor

Kuijpers, A.A. and Krijnen, G.J.M. and Wiegerink, R.J. and Lammerink, T.S.J. and Elwenspoek, M.C. (2005) Analysis Of Micromachined Capacitive Incremental Position Sensor. In: 16th MicroMechanics Europe Workshop, MME 2005, 4-6 September 2005, Göteborg, Sweden.

Preview

PDF
279Kb

Abstract:	This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Transducers Science and Technology (TST)
Link to this item:	http://purl.utwente.nl/publications/54429
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Repository Staff Only: item control page

Metis ID: 228598