Reversible Covalent Patterning of Self-Assembled Monolayers on Gold and Silicon Oxide Surfaces

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Rozkiewicz, Dorota I. and Ravoo, Bart Jan and Reinhoudt, David N. (2005) Reversible Covalent Patterning of Self-Assembled Monolayers on Gold and Silicon Oxide Surfaces. Langmuir, 21 (14). pp. 6337-6343. ISSN 0743-7463

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Abstract:This paper describes the generation of reversible patterns of self-assembled monolayers (SAMs) on gold and silicon oxide surfaces via the formation of reversible covalent bonds. The reactions of (patterned) SAMs of 11-amino-1-undecanethiol (11-AUT) with propanal, pentanal, decanal, or terephthaldialdehyde result in dense imine monolayers. The regeneration of these imine monolayers to the 11-AUT monolayer is obtained by hydrolysis at pH 3. The (patterned) monolayers were characterized by Fourier transform infrared reflection absorption spectroscopy, X-ray photoelectron spectroscopy, contact angle and electrochemical measurements, and atomic force microscopy. Imines can also be formed by microcontact printing of amines on terephthaldialdehyde-terminated substrates. Lucifer Yellow ethylenediamine was employed as a fluorescent amine-containing marker to visualize the reversible covalent patterning on a terephthaldialdehyde-terminated glass surface by confocal microscopy. These experiments demonstrate that with reversible covalent chemistry it is possible to print and erase chemical patterns on surfaces repeatedly.
Item Type:Article
Copyright:© 2005 American Chemical Society
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Link to this item:http://purl.utwente.nl/publications/53010
Official URL:http://dx.doi.org/10.1021/la050438i
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