Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

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Maury, Pascale and Peter, Mária and Mahalingam, Venkataramanan and Reinhoudt, David N. and Huskens, Jurriaan (2005) Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication. Advanced Functional Materials, 15 (3). pp. 451-457. ISSN 1616-301X

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Abstract:Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.
Item Type:Article
Copyright:© 2005 Wiley
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/52995
Official URL:http://dx.doi.org/10.1002/adfm.200400284
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Metis ID: 225078