Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

Maury, Pascale and Peter, Mária and Mahalingam, Venkataramanan and Reinhoudt, David N. and Huskens, Jurriaan (2005) Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication. Advanced Functional Materials, 15 (3). pp. 451-457. ISSN 1616-301X

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Abstract:	Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.
Item Type:	Article
Copyright:	© 2005 Wiley
Faculty:	Science and Technology (TNW)
Research Group:	Molecular Nanofabrication (MNF)
Link to this item:	http://purl.utwente.nl/publications/52995
Official URL:	http://dx.doi.org/10.1002/adfm.200400284
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