Fabrication of 3D Nanowire Frames by Conventional Micromachining Technology


Sarajlic, E. and Berenschot, E. and Krijnen, G. and Elwenspoek, M. (2005) Fabrication of 3D Nanowire Frames by Conventional Micromachining Technology. In: 13th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2005, June 5-9, 2005, Seoul, Korea (pp. pp. 27-30).

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Abstract:We report on a simple parallel processing method capable of producing addressable three-dimensional (3D) nanometer-sized structures, such as wires, wire frames and dots. The method, which is fully compatible with standard micromachining, employs isotropic removal of conformally deposited material onto a prepared template, to form nanostructures in the concave corners of the template. The process results in well-defined nanometer scale structures with exact position and spatial arrangement fully determined by the template. An etching mask with nanometer size features and a nanowire pyramid on a freestanding cantilever have been successfully fabricated, demonstrating the feasibility and potential of this technology.
Item Type:Conference or Workshop Item
Copyright:©2005 IEEE
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/52577
Official URL:https://doi.org/10.1109/SENSOR.2005.1496350
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