Fabrication of Surface Micromachined AlN Piezoelectric Microstructures and its Potential Apllication to RF Resonators


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Saravanan, S. and Berenschot, E. and Krijnen, G. and Elwenspoek, M. (2005) Fabrication of Surface Micromachined AlN Piezoelectric Microstructures and its Potential Apllication to RF Resonators. In: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS (DTIP), 1-3 June 2005, Montreux, Switzerland.

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Abstract:We report on a novel microfabrication method to fabricate aluminum nitride (AlN) piezoelectric microstructures down to 2 microns size by a surface micromachining process. Highly c-axis oriented AlN thin films are deposited between thin Cr electrodes on polysilicon structural layers by rf reactive sputtering. The top Cr layer is used both as a mask to etch the AlN thin films and as an electrode to actuate the AlN piezoelectric layer. The AlN layer is patterned anisotropically by wet etching using a TMAH (25%) solution. This multilayer stack uses silicon-di-oxide as a sacrificial layer to make free-standing structures. One-port scattering paramenter measurement using a network analyzer show a resonant frequency of 1.781 GHz on a clamped-clamped beam suspended structure. The effective electromechanical coupling factor is calculated as 2.4 % and the measured bandwidth is 13.5 MHz for one such a doubly clamped beam (990x30) μm2.
Item Type:Conference or Workshop Item
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/52576
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