Fabrication of microfluidic networks with integrated electrodes


Hermes, D.C. and Heuser, T. and Wouden, E.J. van der and Gardeniers, J.G.E. and Berg, A. van den (2006) Fabrication of microfluidic networks with integrated electrodes. Microsystem Technologies, 12 (5). pp. 436-440. ISSN 0946-7076

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Abstract:In this paper a method is presented for the fabrication of micro-channel networks in glass with integrated and insulated gate electrodes to control the zeta-potential at the insulator surface and therewith the electro-osmotic flow (EOF). The fabrication of the electrodes is a sequence of photolithography, etching and thin film deposition steps on a glass substrate, followed by chemical mechanical polishing (CMP) and subsequently direct thermal bonding to a second glass plate to form closed micro-channels. Plasma enhanced chemical vapor deposition (PECVD) SiO2-layers as insulating material between the electrodes and micro-channels and different electrode materials are examined with respect to a high bonding temperature to obtain an optimal insulating result. A CMP process for the reduction of the SiO2 topography and roughness is studied and optimized in order to obtain a surface that is smooth enough to be directly bondable to a second glass plate.
Item Type:Article
Copyright:© 2006 Springer
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/51045
Official URL:https://doi.org/10.1007/s00542-005-0033-7
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