Fabrication of microfluidic networks with integrated electrodes

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Hermes, D.C. and Heuser, T. and Wouden van der, E.J. and Gardeniers, J.G.E. and Berg van den, A. (2006) Fabrication of microfluidic networks with integrated electrodes. Microsystem Technologies, 12 (5). pp. 436-440. ISSN 0946-7076

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Abstract:In this paper a method is presented for the fabrication of micro-channel networks in glass with integrated and insulated gate electrodes to control the zeta-potential at the insulator surface and therewith the electro-osmotic flow (EOF). The fabrication of the electrodes is a sequence of photolithography, etching and thin film deposition steps on a glass substrate, followed by chemical mechanical polishing (CMP) and subsequently direct thermal bonding to a second glass plate to form closed micro-channels. Plasma enhanced chemical vapor deposition (PECVD) SiO2-layers as insulating material between the electrodes and micro-channels and different electrode materials are examined with respect to a high bonding temperature to obtain an optimal insulating result. A CMP process for the reduction of the SiO2 topography and roughness is studied and optimized in order to obtain a surface that is smooth enough to be directly bondable to a second glass plate.
Item Type:Article
Copyright:© 2006 Springer
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/51045
Official URL:http://dx.doi.org/10.1007/s00542-005-0033-7
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