Molecular Printboards: Monolayers of β-Cyclodextrins on Silicon Oxide Surfaces

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Onclin, Steffen and Mulder, Alart and Huskens, Jurriaan and Ravoo, Bart Jan and Reinhoudt, David N. (2004) Molecular Printboards: Monolayers of β-Cyclodextrins on Silicon Oxide Surfaces. Langmuir, 20 (13). pp. 5460-5466. ISSN 0743-7463

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Abstract:Monolayers of β-cyclodextrin host molecules have been prepared on SiO2 surfaces. An ordered and stable cyano-terminated monolayer was modified in three consecutive surface reactions. First, the cyanide groups were reduced to their corresponding free amines using Red Al as a reducing agent. Second, 1,4-phenylene diisothiocyanate was used to react with the amine monolayer where it acts as a linking molecule, exposing isothiocyanates that can be derivatized further. Finally, per-6-amino β-cyclodextrin was reacted with these isothiocyanate functions to yield a monolayer exposing β-cyclodextrin. All monolayers were characterized by contact angle measurements, ellipsometric thickness measurements, Brewster angle Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry, which indicate the formation of a densely packed cyclodextrin surface. It was demonstrated that the β-cyclodextrin monolayer could bind suitable guest molecules in a reversible manner. A fluorescent molecule (1), equipped with two adamantyl groups for complexation, was adsorbed onto the host monolayer from solution to form a monolayer of guest molecules. Subsequently, the guest molecules were desorbed from the surface by competition with increasing β-cyclodextrin concentration in solution. The data were fitted using a model. An intrinsic binding constant of 3.3 ± 1 × 105 M-1 was obtained, which corresponds well to previously obtained results with a divalent guest molecule on β-cyclodextrin monolayers on gold. In addition, the number of guest molecules bound to the host surface was determined, and a surface coverage of ca. 30% was found.
Item Type:Article
Copyright:© 2004 American Chemical Society
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/49555
Official URL:http://dx.doi.org/10.1021/la049561k
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Metis ID: 222161