Exploring microstencils for sub-micron patterning using pulsed laser deposition
Vroegindeweij, F. and Speets, E.A. and Steen, J.A.J. and Brugger, J.P. and Blank, D.H.A. (2004) Exploring microstencils for sub-micron patterning using pulsed laser deposition. Applied physics A: Materials science & processing, 79 (4-6). pp. 743-745. ISSN 0947-8396
Restricted to UT campus only : Request a copy
|Abstract:||The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm.
Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.
|Copyright:||© Springer 2004|
Science and Technology (TNW)
|Link to this item:||http://purl.utwente.nl/publications/47734|
|Export this item as:||BibTeX|
Daily downloads in the past month
Monthly downloads in the past 12 months
Repository Staff Only: item control page
Metis ID: 218580