Si-compatible ion selective mesoprous and microporous oxide interconnects with high tunability

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Schmuhl, Riaan and Sekulic, Jelena and Roy Chowdhury, Sankhanilay and Rijn, Cees J.M. van and Keizer, Klaas and Berg, Albert van den and Elshof, Johan E. ten and Blank, Dave H.A. (2004) Si-compatible ion selective mesoprous and microporous oxide interconnects with high tunability. Advanced Materials, 16 (11). pp. 900-904. ISSN 0935-9648

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Abstract:A new class of porous oxide interconnects with a regularly perforated SiN support structure is presented here. The method is demonstrated by constructing -alumina, MCM-48 silica (see Figure), and amorphous titania interconnects. Ionic transport through the gate is established by externally varying the potential difference across the interconnects, which allows cationic, anionic, or no transport, depending on the magnitude and sign of the applied potential difference.
Item Type:Article
Copyright:© 2004 WILEY-VCH
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/47732
Official URL:http://dx.doi.org/10.1002/adma.200306660
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Metis ID: 218578