Si-compatible ion selective mesoprous and microporous oxide interconnects with high tunability

Schmuhl, Riaan and Sekulic, Jelena and Roy Chowdhury, Sankhanilay and Rijn van, Cees J.M. and Keizer, Klaas and Berg van den, Albert and Elshof ten, Johan E. and Blank, Dave H.A. (2004) Si-compatible ion selective mesoprous and microporous oxide interconnects with high tunability. Advanced Materials, 16 (11). pp. 900-904. ISSN 0935-9648

PDF
Restricted to UT campus only: Request a copy
161Kb

Abstract:	A new class of porous oxide interconnects with a regularly perforated SiN support structure is presented here. The method is demonstrated by constructing -alumina, MCM-48 silica (see Figure), and amorphous titania interconnects. Ionic transport through the gate is established by externally varying the potential difference across the interconnects, which allows cationic, anionic, or no transport, depending on the magnitude and sign of the applied potential difference.
Item Type:	Article
Copyright:	© 2004 WILEY-VCH
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS) Science and Technology (TNW)
Research Group:	Biomedical and Environmental Sensor systems (BIOS) Inorganic Materials Science (IMS)
Link to this item:	http://purl.utwente.nl/publications/47732
Official URL:	http://dx.doi.org/10.1002/adma.200306660
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Repository Staff Only: item control page

Metis ID: 218578